| 摘要 |
<P>PROBLEM TO BE SOLVED: To more efficiently remove the oxide film formed on the surface of an object to be treated than before. <P>SOLUTION: In a cleaning apparatus 10, hydrogen plasma is generated in a plasma emission chamber 38 in a chamber 12. Then, only the hydrogen radical contained in the hydrogen plasma passes through a shielding plate 36 to a treatment chamber 40. In the treatment chamber 40, the objects to be treated 18 installed on a supporting base 14 are heated by a resistance heater 20, and the oxide films formed on the surfaces of the objects 18 and the hydrogen radical react with each other to reduce and remove the oxide films. Further, vibration is applied to the objects 18 from an ultrasonic vibrator 24 through the supporting base 14 and a coupling rod 22. Thus, the hydrogen radical easily reaches every part of the objects 18, and the reaction of the hydrogen radical and the oxide film is activated. <P>COPYRIGHT: (C)2008,JPO&INPIT |
