| 发明名称 |
LIQUID RECOVERY MEMBER, SUBSTRATE HOLDING MEMBER, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>A substrate holding member (4) is provided with a first holding section (8) for removably holding a substrate (P) to be immersion-exposed, and a second holding section (9) for removably holding a liquid recovery member (30) having an opening section for letting in a liquid (LQ) flowed out from the upper plane of the substrate (P) held by the first holding section (8).</p> |
| 申请公布号 |
WO2007139017(A1) |
申请公布日期 |
2007.12.06 |
| 申请号 |
WO2007JP60703 |
申请日期 |
2007.05.25 |
| 申请人 |
NIKON CORPORATION;NAGASAKA, HIROYUKI |
发明人 |
NAGASAKA, HIROYUKI |
| 分类号 |
H01L21/027;G03F9/00 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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