SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要
<p>An object is to provide a technique to manufacture an insulating film having excellent film characteristics. In particular, an object is to provide a technique to manufacture a dense insulating film with a high withstand voltage. Moreover, an object is to provide a technique to manufacture an insulating film with few electron traps. An insulating film including oxygen is subjected to plasma treatment using a high frequency under the conditions where the electron density is 1 1011 cm-3 or more and the electron temperature is 1.5 eV or less in an atmosphere including oxygen.</p>
申请公布号
WO2007138937(A1)
申请公布日期
2007.12.06
申请号
WO2007JP60477
申请日期
2007.05.16
申请人
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;KAKEHATA, TETSUYA;TANAKA, TETSUHIRO;ASAMI, YOSHINOBU