| 摘要 |
<p>A metrology tool, a system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate are provided to measure a parameter of a substrate where a pattern is provided in a lithography apparatus. A metrology tool includes a base frame(5), a substrate table(10), a one more sensor(7), a displacement system, a first balance mass, and a first bearing. The substrate table is arranged to support a substrate(9). The sensor is arranged to measure a parameter of the substrate. The displacement system displaces one of the substrate table and the sensor in a first direction with respect to another direction. The first bearing supports the first balance mass to be movable. The first bearing movably supports the first balance mass in order to counteract one of displacements of the substrate table and the sensor in the first direction.</p> |
