发明名称 TREATMENT DEVICE AND TREATMENT METHOD
摘要 A processing apparatus and a processing method are provided to prevent a pressure failure of control valve due to an electrostatic discharge and to control certainly the pressure of a process chamber. A process object is processed with a process gas in a process chamber(24). A plurality of gas flow lines include a process gas supply line(30) for supplying the process gas into the process chamber and a process gas discharge line(31) for discharging the process gas from the process chamber. A diaphragm valve is provided on one of the gas flow lines. An antistatic agent source(43) is connected to the one gas flow line at a position upstream of the diaphragm valve to supply an antistatic agent.
申请公布号 KR20070115788(A) 申请公布日期 2007.12.06
申请号 KR20070053950 申请日期 2007.06.01
申请人 TOKYO ELECTRON LIMITED 发明人 HIGASHIJIMA JIRO;OKAMURA NAOYUKI;MAEDA KOUSUKE
分类号 H01L21/304;H01L21/02 主分类号 H01L21/304
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