| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a capable of managing reticles appropriately, by calculating the priorities, of various reticle treatments subjected, on the basis of various kinds of information, a reticle management device, and a management program. <P>SOLUTION: The reticle managing method comprises a parameter grant means 14 for giving a parameter to at least one of various kinds of information, including reticle information used for semiconductor manufacturing, semiconductor information on a semiconductor, and factory information on a semiconductor manufacturing factory; a weighting means 15 for performing weighting to at least one of various kinds of information: and a priority calculation means 16 for calculating the priority of a reticle to be treated by a predetermined processing, on the basis of the parameters and weightings. <P>COPYRIGHT: (C)2008,JPO&INPIT |
