发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithography apparatus and a method for manufacturing a device are provided to prevent discharge of bubbles interfering with an imaging by using a gas knife and pumps. A lower surface of a ring-shaped chamber(31) is formed by a porous plate(30). A liquid removing device is formed by the ring-shaped chamber around an innermost edge of a bottom surface of a seal member(12). A gas extracting ring(32) and a gas supplying ring(33) are arranged on an outside the ring-shaped chamber. The gas supplying ring has a narrow slit on the lower portion thereof. Air, artificial air, or flushing gas are provided under a pressure for forming a gas knife(34) with the gas out of the slit. The ring-shaped chamber is connected to pumps. The gas for forming the gas knife is extracted by the pumps connected to the gas extracting ring. |
申请公布号 |
KR20070115831(A) |
申请公布日期 |
2007.12.06 |
申请号 |
KR20070114244 |
申请日期 |
2007.11.09 |
申请人 |
ASML NETHERLANDS B.V.;ASML HOLDING N.V. |
发明人 |
KEMPER NICOLAAS RUDOLF;COX HENRIKUS HERMAN MARIE;DONDERS SJOERD NICOLAAS LAMBERTUS;DE GRAAF ROELOF FREDERIK;HOOGENDAM CHRISTIAAN ALEXANDER;TEN KATE NICOLAAS;MERTENS JEROEN JOHANNES SOPHIA MARIA;VAN DER MEULEN FRITS;TEUNISSEN FRANCISCUS JOHANNES HERMAN MARIA;VAN DER TOORN JAN GERARD CORNELIS;VERHAGEN MARTINUS CORNELIS MARIA;BELFROID STEFAN PHILIP CHRISTIAAN;SMEULERS JOHANNES PETRUS MARIA;VOGEL HERMAN |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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