发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A lithography apparatus and a method for manufacturing a device are provided to prevent discharge of bubbles interfering with an imaging by using a gas knife and pumps. A lower surface of a ring-shaped chamber(31) is formed by a porous plate(30). A liquid removing device is formed by the ring-shaped chamber around an innermost edge of a bottom surface of a seal member(12). A gas extracting ring(32) and a gas supplying ring(33) are arranged on an outside the ring-shaped chamber. The gas supplying ring has a narrow slit on the lower portion thereof. Air, artificial air, or flushing gas are provided under a pressure for forming a gas knife(34) with the gas out of the slit. The ring-shaped chamber is connected to pumps. The gas for forming the gas knife is extracted by the pumps connected to the gas extracting ring.
申请公布号 KR20070115831(A) 申请公布日期 2007.12.06
申请号 KR20070114244 申请日期 2007.11.09
申请人 ASML NETHERLANDS B.V.;ASML HOLDING N.V. 发明人 KEMPER NICOLAAS RUDOLF;COX HENRIKUS HERMAN MARIE;DONDERS SJOERD NICOLAAS LAMBERTUS;DE GRAAF ROELOF FREDERIK;HOOGENDAM CHRISTIAAN ALEXANDER;TEN KATE NICOLAAS;MERTENS JEROEN JOHANNES SOPHIA MARIA;VAN DER MEULEN FRITS;TEUNISSEN FRANCISCUS JOHANNES HERMAN MARIA;VAN DER TOORN JAN GERARD CORNELIS;VERHAGEN MARTINUS CORNELIS MARIA;BELFROID STEFAN PHILIP CHRISTIAAN;SMEULERS JOHANNES PETRUS MARIA;VOGEL HERMAN
分类号 H01L21/027 主分类号 H01L21/027
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