POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

A positive resist composition comprising a resin ingredient (A) which comes to have enhanced alkali solubility by the action of an acid and an acid generator ingredient (B) which generates an acid upon exposure to light, wherein the resin ingredient (A) has a structural unit (a0) represented by the following general formula (a0) [R is hydrogen, halogeno, lower alkyl, or lower haloalkyl; Y<SUP>1</SUP> is an aliphatic cyclic group; Z is a group containing tert-alkyl; a is an integer of 1-3 and b is an integer of 0-2, provided that a+b is 1-3; and c, d, and e each independently is 0-3] and a structural unit (a1) derived from an acrylic ester of the tert-alkyl ester type which contains an acid-dissociable dissolution-inhibitive group having a polycyclic group. (a0)