发明名称 |
EXPOSURE DEVICE AND EXPOSURE METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive exposure device in which a conveying device of a mask can be structured in a simple configuration and a large mask can be easily conveyed to a mask stage. <P>SOLUTION: A substrate stage 11 of the exposure device PE includes a substrate holding plate where a substrate W is mounted and a plurality of mask holding pins that are disposed as freely approaching and retreating from above the substrate holding plate and that hold a mask M. The plurality of mask holding pins hold the mask M while the mask M is supplied by a mask loader to the substrate stage 11 positioned at a loading position WP1 and the substrate stage 11 is moved from the loading position WP1 to a position below a mask stage 10 and attached to the mask stage 10. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007316561(A) |
申请公布日期 |
2007.12.06 |
申请号 |
JP20060159888 |
申请日期 |
2006.06.08 |
申请人 |
NSK LTD |
发明人 |
TOGASHI TAKUMI;MIYASHITA MASAHIRO |
分类号 |
G03F7/20;H01L21/027;H01L21/677 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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