发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an inexpensive exposure device in which a conveying device of a mask can be structured in a simple configuration and a large mask can be easily conveyed to a mask stage. <P>SOLUTION: A substrate stage 11 of the exposure device PE includes a substrate holding plate where a substrate W is mounted and a plurality of mask holding pins that are disposed as freely approaching and retreating from above the substrate holding plate and that hold a mask M. The plurality of mask holding pins hold the mask M while the mask M is supplied by a mask loader to the substrate stage 11 positioned at a loading position WP1 and the substrate stage 11 is moved from the loading position WP1 to a position below a mask stage 10 and attached to the mask stage 10. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007316561(A) 申请公布日期 2007.12.06
申请号 JP20060159888 申请日期 2006.06.08
申请人 NSK LTD 发明人 TOGASHI TAKUMI;MIYASHITA MASAHIRO
分类号 G03F7/20;H01L21/027;H01L21/677 主分类号 G03F7/20
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