| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which can reduce the amount of materials eluting of a photoresist film comprising the composition when a composite substrate on which the photoresist film has been formed is put in a liquid for liquid immersion exposure, such as water at a liquid immersion exposure step, and which provides a good cross-sectional form of an obtained resist pattern and excels also in resolution and focal depth, and to provide a resist pattern forming method. <P>SOLUTION: The radiation-sensitive resin composition comprises a resin, a radiation-sensitive acid generator, a nitrogen-containing compound and a solvent, wherein the resin contains a repeating unit having a structure which exhibits alkali solubility under the action of an acid and the content of this repeating unit is ≥60 mol% based on the total amount of repeating units constituting the resin. <P>COPYRIGHT: (C)2008,JPO&INPIT |
