发明名称 Electrostatic beam deflection scanner and beam deflection scanning method
摘要 <p>The present invention provides for a beam deflection scanner (20) performs reciprocating deflection scanning with an ion beam or a charged particle beam to thereby periodically change a beam trajectory and comprises a pair of scanning electrodes (21A,21B) installed so as to be opposed to each other with the beam trajectory interposed therebetween and a pair of correction electrodes (27,28) installed in a direction perpendicular to an opposing direction of the pair of scanning electrodes, with the beam trajectory interposed therebetween, and extending along a beam traveling axis. Positive and negative potentials are alternately applied to the pair of scanning electrodes (21A,21B), while a correction voltage is constantly applied to the pair of correction electrodes (27,28). A correction electric field produced by the pair of correction electrodes (27,28) is exerted on the ion beam or the charged particle beam passing between the pair of scanning electrodes (21A,21B) at the time of switching between the positive and negative potentials.</p>
申请公布号 EP1863065(A2) 申请公布日期 2007.12.05
申请号 EP20070109255 申请日期 2007.05.30
申请人 SEN CORPORATION, AN SHI AND AXCELIS COMPANY 发明人 TSUKIHARA, MITSUKUNI;KABASAWA, MITSUAKI;AMANO, YOSHITAKA;MATSUHITA, HIROSHI
分类号 H01J37/147;H01J37/153;H01J37/317 主分类号 H01J37/147
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