发明名称 |
Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks |
摘要 |
The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having overlay marks being disposed between the liquid and the source of light and being opaque to the flux of light, with a pitch of the overlay marks establishing a polarization of the flux of light such that the flux of light impinges upon and polymerizes the liquid in superimposition with the overlay marks.
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申请公布号 |
US7303383(B1) |
申请公布日期 |
2007.12.04 |
申请号 |
US20040864214 |
申请日期 |
2004.06.09 |
申请人 |
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
SREENIVASAN SIDLGATA V.;CHOI BYUNG-JIN;COLBURN MATTHEW E.;BAILEY TODD C. |
分类号 |
B29C35/08;G02B5/18;B29C37/00;G03C5/00;G03F7/00;G03F7/20;H01L21/027 |
主分类号 |
B29C35/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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