发明名称 SPIROBI(HETERO FLUORENE) DERIVATIVE, APPLICATION OF THE SAME, AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a spirobi(hetero fluorene) derivative having excellent oxidation resistance and capable of forming a semiconductor active phase by a coating method, a method for producing the same, and an oxidation-resistant organic semiconductor material and an organic thin film using the spirobi(hetero fluorene) derivative. SOLUTION: The spirobi(hetero fluorene) has a general formula represented by (1), whereΨis a silicon atom, a germanium atom or a tin atom, substituents R<SP>1</SP>-R<SP>4</SP>are similarly or differently a hydrogen atom, a fluorine atom, a 5-20C alkyl group, a 1-20C halogenated alkyl group, a 4-30C aryl group, a 2-20C alkynyl group or a 2-30C alkenyl group, provided that substituents of at least one group of the substituent group of R<SP>1</SP>, R<SP>2</SP>and the substituent group of R<SP>3</SP>, R<SP>4</SP>are bonded with one another to form a ring, and substituents R<SP>5</SP>-R<SP>8</SP>are similarly or differently a hydrogen atom, or a fluorine atom. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007308421(A) 申请公布日期 2007.11.29
申请号 JP20060139464 申请日期 2006.05.18
申请人 TOSOH CORP 发明人 WATANABE MASATO;OHASHI TOMOKAZU
分类号 C07F7/08;H01L51/05;H01L51/30;H01L51/40 主分类号 C07F7/08
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