STRIPPER COMPOSITION FOR PHOTORESIST

摘要

A photoresist stripper composition, a method for stripping a photoresist containing aluminum copper or aluminum and copper on a substrate by using the composition, and a method for preparing a liquid crystal display device and a semiconductor device by using the stripping method are provided to improve the corrosion resistance to an under conductive metallic layer or insulating layer and to allow a photoresist to be removed clearly within a short time. A photoresist stripper composition comprises 1-95 wt% of a polar aprotic solvent. Preferably the polar aprotic solvent is N-methyl formamide, or a polar aprotic solvent mixture containing N-methyl formamide. Optionally the photoresist stripper composition comprises further at least one selected from 1-60 wt% of a water-soluble organic amine compound, 0.01-5 wt% of a corrosion inhibitor, and a water-soluble nonionic surfactant.