发明名称 Method For Detecting Transfer Shift Of Transfer Mechanism And Semiconductor Processing Equipment
摘要 A dummy substrate ( 17 ) differs from a substrate to be processed in having a first guide (G 1 ) for assisting centering, however, it can be handled as a substitute of the substrate to be processed. In a process chamber ( 2 ), a second guide (G 2 ) is arranged to assist the dummy substrate ( 17 ) to center. To detect a transfer shift of a transfer mechanism (TRM), at first, the dummy substrate ( 17 ) is centered to a placing table ( 14 ) on the placing table ( 14 ) or at an upper position thereof by engagement of the first and the second guides (G 1 , G 2 ). The dummy substrate ( 17 ) centered in such a manner is received by the transfer mechanism (TRM) and transferred to a detector ( 11 ). Then, a detection value of a decentering quantity and that in a decentering direction of the dummy substrate ( 17 ) are obtained by the detector ( 11 ), and a transfer shift of the transfer mechanism (TRM) is obtained based on the detection values.
申请公布号 US2007276533(A1) 申请公布日期 2007.11.29
申请号 US20050591875 申请日期 2005.02.22
申请人 TOKYO ELECTRON LIMITED 发明人 MACHIYAMA WATARU
分类号 B25J9/10;B65G49/07;H01L21/00;H01L21/68 主分类号 B25J9/10
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