发明名称 IMPRINT LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To provide a making method of an imprint template. SOLUTION: The making method of the imprint template 44 comprises mounting a transfer layer on a substrate 30; mounting a layer of an imprintable medium 36 on the transfer layer; polymerizing the imprintable medium by exposing the imprintable medium to chemical rays using a master imprint template 38 in order to imprint a pattern on the imprintable medium; and etching the obtained polymer layer, the transfer layer and the substrate so that the imprinted pattern is transferred to the substrate. By this the substrate is converted to the imprint template having the pattern reverse to the pattern mounted on the master imprint template. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007307899(A) 申请公布日期 2007.11.29
申请号 JP20070123276 申请日期 2007.05.08
申请人 ASML NETHERLANDS BV 发明人 WUISTER SANDER FREDERIK;DIJKSMAN JOHAN FREDERIK;KRUIJT-STEGEMAN YVONNE WENDELA;SCHRAM IVAR
分类号 B29C59/02;B29C33/38;H01L21/027 主分类号 B29C59/02
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