发明名称 |
Chemically Amplified Photorestist Composition, Laminated Product, and Connection Element |
摘要 |
There are provided a stable chemically amplified photoresist composition that undergoes no change in alkali solubility prior to irradiation, a photoresist laminated product produced by laminating the photoresist composition onto a support, and a manufacturing method for a photoresist pattern and a manufacturing method for a connection terminal that use the photoresist composition and the laminated product. A chemically amplified photoresist composition is provided comprising (a) a resin that undergoes a change in alkali solubility under the action of acid, (b) a compound that generates acid on irradiation, and (c) a corrosion inhibitor.
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申请公布号 |
US2007275320(A1) |
申请公布日期 |
2007.11.29 |
申请号 |
US20040547830 |
申请日期 |
2004.12.03 |
申请人 |
WASHIO YASUSHI;SAITO KOJI |
发明人 |
WASHIO YASUSHI;SAITO KOJI |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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