| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film having both of excellent steam barrier properties and high transparency because it is known that an organic EL element is extremely weak against oxygen or moisture and the deterioration of the organic EL element caused by the penetration of oxygen and steam into the organic EL element is brought about if the organic EL element is allowed to stand in a state exposed to the atmosphere while it is indispensable to apply barrier properties to a plastic base material in order to realize the flexible organic EL element because the plastic base material is inferior to water and oxygen barrier properties. SOLUTION: The gas barrier film is obtained by providing a silicon oxide (SiOx) film 2 formed using a plasma CVD method using a silane compound as a start raw material on one side or both side of the plastic base material 1. The silicon oxide film 2 is characterized in that an x-value is within a range of 1.9-2.1, a refractive index is within a range of 1.45-1.48 and the ratio of a hydrogen atom in the film is 30% or below. COPYRIGHT: (C)2008,JPO&INPIT
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