| 发明名称 |
APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF DOING THE SAME |
| 摘要 |
An apparatus for processing a substrate includes a gas-atmosphere applying unit for applying gas atmosphere to the substrate, and a light-exposure unit for exposing the substrate to light through a lower surface of the substrate. |
| 申请公布号 |
US2007272355(A1) |
申请公布日期 |
2007.11.29 |
| 申请号 |
US20070754827 |
申请日期 |
2007.05.29 |
| 申请人 |
NEC LCD TECHNOLOGIES, LTD. |
发明人 |
KIDO SHUSAKU |
| 分类号 |
C23F1/00;H01L21/306 |
主分类号 |
C23F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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