| 发明名称 |
PLASMA PROCESSING APPARATUS |
| 摘要 |
<p>A first conductive plate (31A) constituting the radiation surface of a slot antenna (30A) inclines with respect to a first dielectric member (13) opposed to the radiation surface of the slot antenna (30A). Consequently, a plasma generated by the electric field of an electromagnetic field entering directly from the slot antenna (30A) can be set dominant over a plasma generated by the electric field of a standing wave formed in a processing vessel (11). Since the former can be controlled more easily than the latter, the plasma distribution can be improved. <IMAGE></p> |
| 申请公布号 |
EP1306893(A1) |
申请公布日期 |
2003.05.02 |
| 申请号 |
EP20010949933 |
申请日期 |
2001.07.11 |
| 申请人 |
TOKYO ELECTRON LIMITED;YASAKA, YASUYOSHI |
发明人 |
YASAKA, YASUYOSHI;ISHII, NOBUO;SHINOHARA, KIBATSU |
| 分类号 |
H05H1/46;B01J19/08;C23C16/24;C23C16/511;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H05H1/46 |
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