SEMICONDUCTOR DEVICE USING JUNCTION LEAK CURRENT AND ITS MANUFACTURE METHOD,申请号KR20020075232-传众专利搜索

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发明名称	SEMICONDUCTOR DEVICE USING JUNCTION LEAK CURRENT AND ITS MANUFACTURE METHOD
摘要
申请公布号	KR100780539(B1)	申请公布日期	2007.11.29
申请号	KR20020075232	申请日期	2002.11.29
申请人		发明人
分类号	H01L27/04;H01L27/06;H01L21/8234;H01L21/8238;H01L21/8244;H01L27/092;H01L27/11	主分类号	H01L27/04
代理机构		代理人
主权项
地址

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