发明名称 |
MASK FOR PLASMA CVD, AND METHOD OF CLEANING MASK FOR PLASMA CVD |
摘要 |
PROBLEM TO BE SOLVED: To provide a mask for plasma CVD (chemical vapor deposition) where, in a state of maintaining the advantages of a metallic mask, the service life of the mask can be elongated even if a plasma CVD system is used for the cleaning of the mask. SOLUTION: The mask 11 for plasma CVD is provided with: a metallic mask body 12 whose profile is rectangularly formed; and a ceramic cover 13 arranged on the periphery of the metallic mask body 12. The cover 13 is made of aluminum. The mask 11 for plasma CVD is cleaned using a plasma CVD system where a cleaning gas is fed from the side direction of the mask 11 for plasma CVD arranged inside a chamber into the chamber. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2007308763(A) |
申请公布日期 |
2007.11.29 |
申请号 |
JP20060139211 |
申请日期 |
2006.05.18 |
申请人 |
TOYOTA INDUSTRIES CORP |
发明人 |
KIDOKORO ATSUSHI;HAYAKAWA KENJI;SUWA MASAO |
分类号 |
C23C16/04;H01L51/50;H05B33/04;H05B33/10 |
主分类号 |
C23C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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