| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition film forming apparatus capable of forming a deposition film having excellent uniformity in film thickness and film characteristics consistently for a long time. SOLUTION: A vacuum pump unit 132 constituting an exhaust means of a deposition film forming apparatus 110 is connected via an exhaust unit 124 connected to an opening part 125 of a side wall of a reaction container 111. The exhaust unit 124 has an exhaust cylinder mounting plate 126 for covering the opening part 125 with a plurality of holes formed therein, and an exhaust cylinder 126 is attachably/detachably fitted to each hole. At least one of the exhaust cylinders 126 is different in at least one of the opening area and the length, resulting in conductance different from that of other exhaust cylinders. COPYRIGHT: (C)2008,JPO&INPIT
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