发明名称 METHOD AND APPARATUS FOR TREATING FLUORINE COMPOUND CONTAINED IN GAS
摘要 <P>PROBLEM TO BE SOLVED: To efficiently remove a small amount of fluorine compounds contained in a gas to be treated. <P>SOLUTION: The small amount of fluorine compounds contained in the gas to be treated are concentrated with an adsorbent, separated when the adsorbing capacity of the adsorbent reaches its saturation, and treated in a fluorine compound treating apparatus installed in a rear stage. A detecting device for the fluorine compounds installed at the downstream of an adsorbing column monitors the concentration of the fluorine compounds passed through without being sufficiently adsorbed with the adsorbent, and heating of the fluorine compound treating apparatus and a gas heater heating the gas flowing in for separating the fluorine compounds starts after confirmation of the passing through of the unadsorbed fluorine compounds. Excessive running costs are saved by controlling a heating time. Further, since the gas heater is characterized by fast heating, the cycle of adsorption or separation is accelerated by fast separating the adsorbed fluorine compounds through fast heating and the amount of filling adsorbent is reduced, thereby making apparatus compact. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007301467(A) 申请公布日期 2007.11.22
申请号 JP20060132068 申请日期 2006.05.11
申请人 HITACHI LTD 发明人 SASAKI TAKASHI;SUGANO SHUICHI;TAMADA SHIN
分类号 B01D53/46;B01D53/70;B01D53/86 主分类号 B01D53/46
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