| 摘要 |
<p>An apparatus for conveying a substrate, a method for conveying a substrate, and a system for processing a substrate are provided to suppress generation of particles by reducing mechanical contact and friction. An apparatus for conveying a substrate includes a fixing stage(310) and a movable stage(320). A plurality of conveyer rollers(321) for conveying a substrate, a roller magnet(323) installed at the conveyer rollers, and driven magnets(331,332,333) coupled magnetically with the roller magnet are arranged on the movable stage. The driven magnets are magnetically coupled with a driving magnet(330) installed outside a chamber and the substrate is separated apart from the fixing stage and is supported by the conveyer rollers when the movable stage is positioned in a rising point. The driven magnet and the driving magnet are magnetically separated from each other and the substrate is loaded on the fixing stage when the movable stage is positioned in a falling point.</p> |
