An apparatus for processing a substrate, a method for processing a substrate and a method for forming a pattern,申请号KR20050053316-传众专利搜索

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发明名称	An apparatus for processing a substrate, a method for processing a substrate and a method for forming a pattern
摘要
申请公布号	KR100778326(B1)	申请公布日期	2007.11.22
申请号	KR20050053316	申请日期	2005.06.21
申请人		发明人
分类号	H01L21/027;G02F1/13;G03F7/30;H01L21/02;H01L21/306	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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