| 发明名称 |
IMPRINT LITHOGRAPHY METHOD AND SYSTEM |
| 摘要 |
The present invention is directed towards several aspects of imprint lithography that have to be improved to address imprinting of partial fields and dies at the edge of the wafer. |
| 申请公布号 |
WO2007133346(A2) |
申请公布日期 |
2007.11.22 |
| 申请号 |
WO2007US08077 |
申请日期 |
2007.04.02 |
| 申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
SREENIVASAN, SIDLGATA, V.;CHOI, BYUNG-JIN |
| 分类号 |
G06Q30/00 |
主分类号 |
G06Q30/00 |
| 代理机构 |
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