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发明名称
METHOD FOR FORMING SELF-ALIGNED, DUAL SILICON NITRIDE LINER FOR CMOS DEVICES
摘要
申请公布号
EP1856726(A1)
申请公布日期
2007.11.21
申请号
EP20060720946
申请日期
2006.02.21
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
DYER, THOMAS, W.;YANG, HAINING
分类号
H01L21/336
主分类号
H01L21/336
代理机构
代理人
主权项
地址
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