发明名称 SUBSTRATE CARRIER AND FACILITY INTERFACE AND APPARATUS INCLUDING SAME
摘要 A substrate carrier is provided to support at least one substrate by installing at least one substrate holder in an enclosure including a door. A carrier(200) includes an enclosure(210) with a door(220), a cabinet(230) and at least one substrate holder. The cabinet includes at least one valve and at least one reduction fluid(235), coupled to the carrier. The substrate holder is disposed in the enclosure to support at least one substrate(280). The carrier maintains higher pressure than that of the surroundings surrounding the carrier. The reduction fluid includes at least one of reduction gas and non-reactive gas with respect to the surface of the substrate.
申请公布号 KR20070111311(A) 申请公布日期 2007.11.21
申请号 KR20070003834 申请日期 2007.01.12
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 YU CHEN HUA;HSIAO YI LI
分类号 H01L21/673 主分类号 H01L21/673
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