发明名称 Method of manufacturing a multi-layer semiconductor nanoparticle, and a multi-layer semiconductor nanoparticle manufactured by the method
摘要 <p>Multi-layered semiconductor nanoparticles having a very narrow grain-size distribution and exhibiting a spectrum having a narrow wavelength-width peak are prepared by a manufacturing method combining a monodisperse semiconductor nanoparticle manufacturing method and a multi-layer semiconductor nanoparticle preparation method. The nature of a solution of monodisperse semiconductor nanoparticles that is stabilized by a surface stabilizer is transformed between hydrophilic and lipophilic by substituting the surface stabilizer. The stabilized semiconductor nanoparticles are then shifted between an aqueous layer and an organic layer. The semiconductor nanoparticles are coated with multiple layers in the organic layer, and the organic layer is drawn off to recover the semiconductor nanoparticles therefrom.</p>
申请公布号 EP1333064(B1) 申请公布日期 2007.11.21
申请号 EP20030001539 申请日期 2003.01.23
申请人 HITACHI SOFTWARE ENGINEERING CO., LTD. 发明人 SATO, KEIICHI;KUWABATA, SUSUMU
分类号 C01G11/02;C09C3/08;B82Y20/00;B82Y30/00;C09C3/00;C09C3/06;C09K11/56 主分类号 C01G11/02
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