| 摘要 |
An illumination system and a photolithography apparatus are provided to transfer patterns having an improved contrast by improving a structure thereof. A reticle includes a plurality of patterns to be transferred to a substrate. An optical projection system projects an image of the reticle onto the substrate and has an aberration. An illumination system includes an illuminating light source for generating an electromagnetic radiation, a polarization unit, and a device for generating an illumination distribution part(6). The illumination distribution part is generated by using the device having a center point(32) and an external edge(33). The illumination distribution part includes a first opaque portion(34), a second opaque portion(35), and a radiation transmitting portion(36) arranged between the first and second opaque portions. The polarization unit is arranged between the illuminating light source and the device in order to generate the electromagnetic radiations having polarizing directions(311a,311b,311c,311d). |
