COMPOUND, DISSOLUTION INHIBITOR, POSITIVE-WORKING RESIST COMPOSITION, AND METHOD FOR RESIST PATTERN FORMATION

摘要

This invention provides a positive-working resist composition, which uses a low-molecular material as a base component and can form a high-resolution resist pattern, and a method for resist pattern formation, a compound suitable for the positive-working resist composition, and a dissolution inhibitor. The compound is a nonpolymer having a molecular weight of 500 to 3000 and is decomposed by the action of an acid to give two or more molecules of a decomposition product having a molecular weight of not less than 200. The dissolution inhibitor contains the compound. The positive-working resist composition comprises the compound and an acid generating agent component. In the method for resist pattern formation, the positive-working resist composition is used.