RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING PROCESS

摘要

A method for preparing a polymer for a resist material, a polymer for a resist material prepared by the method, a resist material containing the polymer, and a method for forming a pattern by using the resist material are provided to reduce the component insoluble in a resist solvent and to decrease the number of defect in photolithography. A method for preparing a polymer for a resist material comprises the steps of adding a solution containing a chain transfer agent in a reactor and maintaining a temperature of the reactor at a polymerization temperature; and continuously or discontinuously adding a solution containing a monomer and a polymerization initiator drop by drop for radical polymerization at the temperature. Preferably the chain transfer agent is a thiol compound.