| 摘要 |
A method of fabricating an array substrate for an LCD using a photosensitive metal paste is provided to pattern gate and data lines, a gate electrode, and source and drain electrodes through a simplified process without using a photoresist to simplify the fabrication process and reduce the process time of the array substrate. A pixel area is defined in a substrate(101). A first photosensitive metal paste is applied on the substrate to form a first photosensitive metal layer(105). The first photosensitive metal layer is exposed and developed to form a gate line extending in one direction and a gate electrode diverging from the gate line. A gate insulating layer and a semiconductor layer are formed on the gate electrode. A second photosensitive metal paste is applied on an entire surface of the semiconductor layer, exposed and developed to form a data line, a source electrode, and a drain electrode. The data line intersects the gate line to define the pixel area. The source electrode is connected to the data line on the semiconductor layer and the drain electrode is separated from the source electrode. An insulating layer is formed on the date line and source and drain electrodes. The insulating layer is patterned to form a protective layer pattern exposing the substrate corresponding to a center portion of the pixel area and an end portion of the drain electrode. A pixel electrode, which directly contacts the end portion of the drain electrode and the substrate, is formed in the center portion of the pixel area. |
