<p>An end effector is provided to improve a yield by suppressing generation of particles due to an undesired contact in a wafer transferring process. A first supporting member(10) is formed with a shape of plate. A second supporting member(20) is coupled with the first supporting member in order to be moved relatively to the first supporting member along a proximal direction to the first supporting member or a separative direction from the first supporting member. A first grip member(30) is coupled with a lower side of a front end of the first supporting member. A first reception part(31) is formed in the inside of the first grip member in order to receive one edge of a wafer. A second grip member(40) is coupled with a lower side of the second supporting member. A second reception part(41) is formed in the inside of the second grip member in order to receive the other edge of the wafer. One side and the other side of the wafer are gripped by the first and second grip members when the first and second supporting members approach each other.</p>
申请公布号
KR100777201(B1)
申请公布日期
2007.11.16
申请号
KR20060130697
申请日期
2006.12.20
申请人
SILTRON INC.
发明人
SEO, WOO HYUN;HONG, JIN KYUN;KIM, KUN;SONG, KYOUNG HWAN