Enhanced sputter target alloy compositions,申请号KR20050046082-传众专利搜索

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发明名称	Enhanced sputter target alloy compositions
摘要
申请公布号	KR100776383(B1)	申请公布日期	2007.11.16
申请号	KR20050046082	申请日期	2005.05.31
申请人		发明人
分类号	C23C14/34;C22C19/07;C23C14/20;G11B5/64;G11B5/66;G11B5/85;G11B5/851	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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