| 摘要 |
A known method for producing synthetic quartz glass with a predetermined hydroxyl group content comprises the following steps: a porous SiO<SUB>2 </SUB>soot body is produced by flame hydrolysis or oxidation of a silicon-containing start compound and by layerwise deposition of SiO<SUB>2 </SUB>particles on a rotating support; the soot body is subjected to a dehydration treatment in a reaction gas-containing drying atmosphere at a drying temperature for removing hydroxyl groups; and the SiO<SUB>2 </SUB>soot body is vitrified into a body consisting of the synthetic quartz glass. Starting from this, and in order to permit a reproducible and reliable manufacture of synthetic, UV-radiation resistant quartz glass with predetermined hydroxyl group content and low chlorine content, it is suggested according to the invention that the dehydration treatment according to method step (b) comprises a drying phase during which ozone is used as the reaction gas, whereby the ozone content of the drying atmosphere is between 0.5% by vol. and 10% by vol. and the drying temperature is chosen in the range between 1200° C. and 1400° C., and whereby no halogens are supplied to the drying atmosphere.
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