| 摘要 |
Provided is an exposure apparatus that is able to prevent liquid from on a measuring part. An exposure apparatus comprises a measuring system ( 60 ), which has a first pattern ( 61 ) formed on the upper surface of a substrate stage, and a second area (S 2 ) specified on the upper surface in the vicinity of a first area (S 1 ), which includes the first pattern ( 61 ), and a second pattern ( 80 ) is formed in the second area (S 2 ) so that the liquid (LQ) that has remained so as to span the first area (S 1 ) and the second area (S 2 ) retreats from the first area (S 1 ) and collects in the second area (S 2 ).
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