发明名称 |
EXPOSURE EQUIPMENT OF SEMICONDUCTOR DEVICE AND METHOD FOR EXPOSURE OF SEMICONDUCTOR DEVICE |
摘要 |
<p>An apparatus and a method for exposing a semiconductor device are provided to improve a resolution by using only the TE polarized light for patterning when performing an exposure process by controlling a position of hole of an illumination system. An exposure apparatus comprises a light source(100), a reticle part(120), a lens part(130) and a wafer stage(140). An illumination system(105) is installed between the light source and the reticle part. A permeable material part(110) having a cylinder shape is installed between the illumination system and the reticle part.</p> |
申请公布号 |
KR20070109648(A) |
申请公布日期 |
2007.11.15 |
申请号 |
KR20060042951 |
申请日期 |
2006.05.12 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
EOM, TAE SEUNG;BOK, CHEOL KYU |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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