| 发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a positive photosensitive resin composition which can easily be prepared without carrying out a complicated process, and which does not require heating after exposure in resist pattern formation and has excellent performance. <P>SOLUTION: The positive photosensitive resin composition comprises (A) an alkali-soluble resin and (B) a photo-radical generator which is an α-amino substituted acetophenone derivative. A resist pattern forming method using the composition and a conductor pattern forming method using the composition are also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2007298758(A) |
申请公布日期 |
2007.11.15 |
| 申请号 |
JP20060126846 |
申请日期 |
2006.04.28 |
| 申请人 |
KANSAI PAINT CO LTD |
发明人 |
OZAKI KAZUHIRO;TAKEZOE KOJI |
| 分类号 |
G03F7/004;G03F7/032;G03F7/16;G03F7/40;H01L21/027 |
主分类号 |
G03F7/004 |
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