PLASMA GENERATION APPARATUS FOR UNIFORMLY GENERATING LARGE SCALE INDUCTIVELY COUPLED PLASMA

摘要

A plasma generator for uniformly generating large-scale inductively coupled plasma is provided to facilitate deposition of a silicon nitride film, a silicon oxide film, and poly silicon at low temperature and to prevent unnecessary discharge around a gas injector by grounding the gas injector while the gas injector is electrically insulated from an antenna module. A plasma generator(100) for uniformly generating large scale inductively coupled plasma includes a chamber(110) for forming a predetermined reaction space and having a substrate placing plate(120); a gas injector(140) installed on the upper part of the substrate placing plate in the chamber; a plasma generating source installed through the gas injector; and a power supply unit(160) positioned at the outer side of the chamber and connected to the plasma generating source.