CHEMICAL FUME REMOVAL UNIT AND WET PROCESSING EQUIPMENT HAVING THE SAME

摘要

A chemical fume removal unit and a wet processing apparatus having the same are provided to prevent generation of particles by removing easily fume caused by chemicals to be injected to a wafer. A nozzle(314) is formed to inject chemicals with constant pressure. A chemical fume removal part(320) is positioned at a periphery of the nozzle in order to remove chemical fume caused by the injection of the chemicals. The chemical fume removal part includes one or plural vacuum absorbing tubes(321) arranged in a predetermined interval from the nozzle, a vacuum pump(322) connected to the vacuum absorbing tube, and a control unit(323) connected electrically to the vacuum pump. The control unit controls the vacuum pump in order to form vacuum suction applied through the vacuum absorbing tube lower than the injection pressure of the chemicals.