| 发明名称 |
Projection exposure apparatus |
| 摘要 |
<p>A projection illumination device, especially for microlithography, for producing an image in a mask object plane comprises a light source and projection optics between the mask and image having five groups of optical components of alternating refractivity (LG1-5) and three optical sub-groups.</p> |
| 申请公布号 |
EP1291719(B1) |
申请公布日期 |
2007.11.14 |
| 申请号 |
EP20020015054 |
申请日期 |
2002.07.05 |
| 申请人 |
CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG |
发明人 |
KNEER, BERNHARD;RICHTER, GERALD, DR. |
| 分类号 |
G02B13/24;G03F7/20;G02B15/14;G02B27/18;H01L21/027 |
主分类号 |
G02B13/24 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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