| 摘要 |
The invention concerns an optical element ( 1 ) with an optical axis ( 3 ), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension ( 2, 2 ') in the direction of the optical axis ( 3 ). A device ( 11 ) enables to induce a two-wave or multiple wave deformation in said optical element ( 1 ). At least a system ( 12 ) mounted in the extension zone ( 2, 2 ') is designed to apply a force in said extension ( 2, 2 ').
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