METHOD FOR MANUFACTURING A CONDUCTIVE COMPOSITION AND A REAR SUBSTRATE OF A PLASMA DISPLAY

摘要

A conductive composition is provided to form an address electrode having high chemical etching durability, and prevent the address electrode from being damaged during a chemical etching process in which a plasma display panel is formed by chemical etching. A conductive composition comprises a silver powder having an average diameter of 1.0-2.5 micron and a lead-containing glass frit. A ratio of the lead-containing glass frit content to the silver powder content is from 0.75:99.25 to 6.0:94.0. The lead-containing glass frit has a softening point of 430-510 °C, and comprises PbO, B2O3, and SiO2. When barriers(504') in a plasma display are formed by chemical etching, the conductive composition is used for an address electrode(314).