发明名称 |
METHOD FOR PRODUCING FILM-PRODUCING RESIN FOR PHOTORESIST COMPOSITION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film-producing resin suitable for use in photolithography compositions. <P>SOLUTION: This method for producing a film-producing resin suitable for use in photolithography compositions comprises passing a solution of the film-producing resin in a solvent through two filter sheets, wherein one of the two filter sheets contains a granular strongly cationic or weakly cationic ion exchange resin; the other contains a granular strongly anionic or weakly anionic ion exchange resin; the filter sheets are rinsed with the solvent used for the preparation of the solution; and the solution of the film-producing resin is passed through the first filter sheet and then the second filter sheet. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007291387(A) |
申请公布日期 |
2007.11.08 |
申请号 |
JP20070105563 |
申请日期 |
2007.04.13 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP |
发明人 |
RAHMAN M DALIL;MCKENZIE DOUGLAS |
分类号 |
C08J3/00;B01D37/02;G03F7/039 |
主分类号 |
C08J3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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