发明名称 METHOD FOR PRODUCING FILM-PRODUCING RESIN FOR PHOTORESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a film-producing resin suitable for use in photolithography compositions. <P>SOLUTION: This method for producing a film-producing resin suitable for use in photolithography compositions comprises passing a solution of the film-producing resin in a solvent through two filter sheets, wherein one of the two filter sheets contains a granular strongly cationic or weakly cationic ion exchange resin; the other contains a granular strongly anionic or weakly anionic ion exchange resin; the filter sheets are rinsed with the solvent used for the preparation of the solution; and the solution of the film-producing resin is passed through the first filter sheet and then the second filter sheet. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007291387(A) 申请公布日期 2007.11.08
申请号 JP20070105563 申请日期 2007.04.13
申请人 AZ ELECTRONIC MATERIALS USA CORP 发明人 RAHMAN M DALIL;MCKENZIE DOUGLAS
分类号 C08J3/00;B01D37/02;G03F7/039 主分类号 C08J3/00
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