发明名称 |
MEASURING LAYER THICKNESS OR COMPOSITION CHANGES |
摘要 |
A method of measuring the thickness or the rate of change of thickness of a layer as the layer is being formed on a substrate, includes illuminating the layer through the substrate with low coherence light that transmits through the layer; collecting a portion of the reflected light from each optical interface of the substrate and layer with a low coherence interferometer; and, calculating the thickness or the rate of change of thickness of the layer according to the obtained interferometric data.
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申请公布号 |
US2007260422(A1) |
申请公布日期 |
2007.11.08 |
申请号 |
US20070779570 |
申请日期 |
2007.07.18 |
申请人 |
MARCUS MICHAEL A;SWITALSKI STEVEN C |
发明人 |
MARCUS MICHAEL A.;SWITALSKI STEVEN C. |
分类号 |
G01B11/06 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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