发明名称 MEASURING LAYER THICKNESS OR COMPOSITION CHANGES
摘要 A method of measuring the thickness or the rate of change of thickness of a layer as the layer is being formed on a substrate, includes illuminating the layer through the substrate with low coherence light that transmits through the layer; collecting a portion of the reflected light from each optical interface of the substrate and layer with a low coherence interferometer; and, calculating the thickness or the rate of change of thickness of the layer according to the obtained interferometric data.
申请公布号 US2007260422(A1) 申请公布日期 2007.11.08
申请号 US20070779570 申请日期 2007.07.18
申请人 MARCUS MICHAEL A;SWITALSKI STEVEN C 发明人 MARCUS MICHAEL A.;SWITALSKI STEVEN C.
分类号 G01B11/06 主分类号 G01B11/06
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