发明名称 |
HOOD FOR IMMERSION LITHOGRAPHY |
摘要 |
A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least one of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.
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申请公布号 |
US2007258060(A1) |
申请公布日期 |
2007.11.08 |
申请号 |
US20060427434 |
申请日期 |
2006.06.29 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHEN LI-JUI;FU TZUNG-CHI;CHANG CHING-YU;LIANG FU-JYE;SHIU LIN-HUNG;CHEN CHUN-KUANG;GAU TSAI-SHENG |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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