发明名称 METHOD OF MANUFACTURING SOLID STATE IMAGING APPARATUS
摘要 PROBLEM TO BE SOLVED: To suppress the occurrence of the damage of a solid state imaging apparatus, and suppress reduction in its transmission coefficient, and reduce the number of its processes, by forming its on-chip lenses and its shrinking layers simultaneously. SOLUTION: The forming process of the on-chip lenses of the solid photographing device 1 has a step of forming a lens material layer on a flattening film 12 present above photoelectric converting elements 21 to form lens forming patterns 13 for forming the on-chip lenses by processing the lens material layer; a step of forming a shrinking layer 14 by a heat treatment along the deformation of the surfaces of the lens forming patterns 13 to cover the lens forming patterns 13; and a step of subjecting the shrinking layer 14 and the lens forming patterns 13 to a heat treatment to deform the lens forming patterns 13 in the form of convex lenses and to form on-chip lenses 15, and for deforming the shrinking layers 14 in the form of films which are parallel with the deformations of the surfaces of the lens forming patterns 13. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007294779(A) 申请公布日期 2007.11.08
申请号 JP20060122823 申请日期 2006.04.27
申请人 SONY CORP 发明人 OGINO AKIKO;NATORI TAICHI
分类号 H01L27/14;G02B3/00 主分类号 H01L27/14
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