| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a Co-based sintered alloy sputtering target which is used in forming a magnetic recording film and generate few particles. SOLUTION: A raw powder to be prepared includes a Cr-Co alloy powder containing 50 to 70 atom% Cr and the balance Co, a Pt powder, a powder of a nonmagnetic oxide (powder of silicon dioxide, tantalum oxide, titanium oxide, aluminum oxide, magnesium oxide, thorium oxide, zirconium oxide, cerium oxide, yttrium oxide or the like), and a Co powder. The method for manufacturing the sputtering target comprises the steps of: blending those raw powders so as to have a component composition containing a nonmagnetic oxide of 2 to 15 mol%, 3 to 20 mol% Cr, 5 to 30 mol% Pt and the balance Co; mixing the blended powder; and pressure-sintering the mixture with a hot-pressing technique, a hot-isostatic-pressing technique or the like. COPYRIGHT: (C)2008,JPO&INPIT
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